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SiO2:ZnO Thin Films Prepared by Sol-Gel Method and Deposited Using Ion-Beam Sputtering: Structure, Morphology, and Optical and Electrical Performance

dc.contributor.authorAl-Kamali, M. F. S. H.
dc.contributor.authorBoiko, A. A.
dc.contributor.authorKovalenko, D.
dc.contributor.authorAl-Areqi, N. A. S.
dc.coverage.spatialTaizru_RU
dc.date.accessioned2023-09-25T06:34:36Z
dc.date.available2023-09-25T06:34:36Z
dc.date.issued2022
dc.identifier.citationSiO2:ZnO Thin Films Prepared by Sol-Gel Method and Deposited Using Ion-Beam Sputtering: Structure, Morphology, and Optical and Electrical Performance / M. F. S. H. Al-Kamali [et. al.] // 2nd International Conference of Science and Administration - 2022 (2nd ICTSA-2022), 7-19 december 2022 : book of abstracts. – Taiz, Yemen : Taiz University, 2022. - P. 115.ru_RU
dc.identifier.urihttps://elib.gstu.by/handle/220612/28816
dc.language.isoenru_RU
dc.publisherTaiz Universityru_RU
dc.subjectIon- beam Sputteringru_RU
dc.subjectSol-gelru_RU
dc.subjectZinc ionru_RU
dc.subjectBand gapru_RU
dc.subjectSiO2:ZnOru_RU
dc.subjectMorphologyru_RU
dc.subjectHigh-silica thin filmsru_RU
dc.subjectXRDru_RU
dc.subjectSEMru_RU
dc.titleSiO2:ZnO Thin Films Prepared by Sol-Gel Method and Deposited Using Ion-Beam Sputtering: Structure, Morphology, and Optical and Electrical Performanceru_RU
dc.typeArticleru_RU


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